Well-controlled sub-unit-cell layer-bylayer epitaxial growth of spinel alumina is achieved at room temperature on a TiO2-terminated SrTiO3 single-crystalline substrate. By tailoring the interface redox reaction, 2D electron gases with mobilities exceeding 3000 cm 2 V−1 s−1 are achieved at this novel oxide interface.
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机译:在室温下,在以TiO2为末端的SrTiO3单晶衬底上,可以很好地控制尖晶石氧化铝的亚单元细胞逐层外延生长。通过定制界面氧化还原反应,在该新型氧化物界面上获得了迁移率超过3000 cm 2 V-1 s-1的二维电子气。
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